Scopus İndeksli Yayınlar Koleksiyonu
Permanent URI for this collectionhttps://hdl.handle.net/20.500.12416/8651
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Article Citation - WoS: 5Citation - Scopus: 7Structural and Optical Properties of Thermally Annealed Thallium Indium Disulfide Thin Films(Elsevier Science Sa, 2020) Gasanly, N.; Guler, IStructural and optical properties of thallium indium disulfide (TlInS2) thin films, deposited by thermal evaporation technique and thermally annealed at different temperatures, were analyzed. Crystallite size, dislocation density and lattice strain of the thin films were found from X-ray diffraction experiments. The atomic compositions of the films were determined from energy dispersive spectroscopy analysis. Surface morphology of the films was analyzed using atomic force microscopy. From room temperature transmittance spectrum, the band gap energies of the films were identified. The decrease in band gap energies of the films with the annealing temperature up to 300 degrees C was observed due to increase in crystallite size and decrease in lattice strain. From Raman measurements, it was observed that the Raman shifts of the films were well correlated with those of TlInS2 bulk crystal.Article Citation - WoS: 53Citation - Scopus: 56Optical and Structural Characterization of Silicon Nitride Thin Films Deposited by Pecvd(Elsevier, 2019) Guler, IPlasma enhanced chemical vapor deposition (PECVD) technique was used to deposit silicon nitride (SiNx) thin films. The silane (SiH4) and ammonia (NH3) were used as reactant gases. Both the flow rates of the NH3 and SiH4 gases were changed but total flow rate kept constant to obtain the different ratio nitrogen (N) in the SiNx films. Fourier transform infrared spectroscopy (FTIR) was used to get information about absorption ratios of the films and the bond types in the films. The refractive index of the films was obtained from ellipsometry measurements. From FTIR measurements and ellipsometry measurements, refractive index for amorphous silicon (Si) and refractive index for stoichiometric SiNx were found as 3.27 and 1.91, respectively. The photoluminescence (PL) measurements were used to see the luminescent of the amorphous Si nanoparticles which were occurred spontaneously during deposition process. High resolution transmission electron microscopy (HRTEM) was used to analyze the Si nanoparticle size.