Kimya Bilim Dalı Koleksiyonu
Permanent URI for this collectionhttps://hdl.handle.net/20.500.12416/4839
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Article Citation - WoS: 3Citation - Scopus: 4Development of a Selective Wet-Chemical Etchant for Precise 3d Sculpting of Silicon Enabled by Infrared Non-Linear Laser Modification(Elsevier Sci Ltd, 2024) Borra, Mona Zolfaghari; Radfar, Behrad; Nasser, Hisham; Colakoglu, Tahir; Tokel, Onur; Turnali, Ahmet; Bek, Alpan; Zolfaghari Borra, MonaRecently-demonstrated high-quality three-dimensional (3D) subsurface laser processing inside crystalline silicon (c-Si) wafers opens a door to a wide range of novel applications in multidisciplinary research areas. Using this technique, novel maskless micro-pillars with precise control on the surface reflection and coverage are successfully fabricated by etching the laser-processed region of the c-Si wafer. To achieve this, a particular selective wet chemical etching is developed to follow subsurface laser processing of c-Si to reveal the desired 3D structures with smooth surfaces. Here, we report the development of a novel chromium-free chemical etching recipe based on copper nitrate, which yields substantially smooth surfaces at a high etch rate and selectivity on the both laserprocessed Si surface and subsurface, i.e., without significant etching of the unmodified Si. Our results show that the etch rate and surface morphology are interrelated and strongly influenced by the composition of the adopted etching solution. After an extensive compositional study performed at room temperature, we identify an etchant with a selectivity of over 1600 times for laser-modified Si with respect to unmodified Si. We also support our findings using density functional theory calculations of HF and Cu adsorption energies, indicating significant diversity on the c-Si and laser-modified surfaces.Article Fosfonat-substitüye Bodıpy Tasarımı, Sentezi ve Spektroskopik/fotofiziksel Karakterizasyonu(2020) Taşgın, Dilek IşıkBODIPY bileşikleri floresan sensör veya boya olarak geniş kullanım alanına sahip olması ve üstün fotofiziksel özelliklerinden dolayı multidisipliner alanlardaki bilim insanlarının ilgisini çekmeye devam etmektedir. Bu çalışmada, yeni bir fosfonat-substitüye BODIPY boyası, pirol ve aldehitten kondenzasyon-yükseltgenme-kompleksleşme metodu kullanılarak sentezlenmiştir. Sentezlenen BODIPY bileşiğinin yapısı ve fotofiziksel özellikleri 1 H NMR, 13C NMR, 31P NMR, 19F NMR, UV-Vis absorpsiyon ve floresans spektroskopi teknikleriyle tanımlanmıştır.